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  <title>NOPR Community:</title>
  <link rel="alternate" href="http://nopr.niscpr.res.in/handle/123456789/16335" />
  <subtitle />
  <id>http://nopr.niscpr.res.in/handle/123456789/16335</id>
  <updated>2026-10-08T23:40:45Z</updated>
  <dc:date>2026-10-08T23:40:45Z</dc:date>
  <entry>
    <title>Spectroscopic studies on curing of novolac epoxy resin—Polyamide and polyamine hardener systems in presence of a polysulphide</title>
    <link rel="alternate" href="http://nopr.niscpr.res.in/handle/123456789/24470" />
    <author>
      <name>Makashir, P S</name>
    </author>
    <author>
      <name>Agawane, NT</name>
    </author>
    <author>
      <name>Mahajan, R R</name>
    </author>
    <author>
      <name>Agrawal, J P</name>
    </author>
    <id>http://nopr.niscpr.res.in/handle/123456789/24470</id>
    <updated>2013-12-04T16:39:29Z</updated>
    <published>2001-12-01T00:00:00Z</published>
    <summary type="text">Title: Spectroscopic studies on curing of novolac epoxy resin—Polyamide and polyamine hardener systems in presence of a polysulphide
Authors: Makashir, P S; Agawane, NT; Mahajan, R R; Agrawal, J P
Abstract: Novolac epoxy resins have recently been&#xD;
reported for inhibition of hydroxy terminated polybutadiene (HTPB) based composite&#xD;
propellants and their elongation has been improved by the incorporation of some&#xD;
flexibilizers. In the present investigation, curing behaviour of a novolac epoxy&#xD;
resin (Dobeckot E4) by hardeners (polyamide EH 411 and polyamine H&#xD;
&#xD;
758) in conjunction with a polysulphide&#xD;
flexibilizer has been studied using infrared (IR) spectroscopy. It is observed that&#xD;
the rate of curing of Dobeckot E4 by hardeners such as hardener EH411 and hardener&#xD;
H 758, is higher as compared to polysulphide flexibilizer LP-33. Further, rate of&#xD;
curing of epoxy resin by hardeners such as EH411 and H758 enhances in&#xD;
&#xD;
the presence of flexibilizer LP-33. The curing&#xD;
studies by infrared (IR) spectroscopy suggest that hardeners EH41l/H758 react with&#xD;
epoxy ring of epoxy resin and as a result, epoxy ring opens while curing. Similarly,&#xD;
-SH group of polysulphide flexibilizer LP-33, reacts with the epoxy ring of resin&#xD;
and opens it as curing progresses and thus enhances the rate of curing&#xD;
&#xD;
of epoxy resin in conjunction with hardeners&#xD;
EH411/H758. This is also supported by the gel time and exotherm peak temperature&#xD;
data.
Page(s): 381-385</summary>
    <dc:date>2001-12-01T00:00:00Z</dc:date>
  </entry>
  <entry>
    <title>Optical waveguiding in vacuum deposited polyaniline thin films</title>
    <link rel="alternate" href="http://nopr.niscpr.res.in/handle/123456789/24468" />
    <author>
      <name>Sharma, Sudhir Kumar</name>
    </author>
    <author>
      <name>Sharma, V K</name>
    </author>
    <author>
      <name>Kapoor, A</name>
    </author>
    <author>
      <name>Misra, S C K</name>
    </author>
    <author>
      <name>Tripathi, K N</name>
    </author>
    <id>http://nopr.niscpr.res.in/handle/123456789/24468</id>
    <updated>2013-12-05T16:39:20Z</updated>
    <published>2001-12-01T00:00:00Z</published>
    <summary type="text">Title: Optical waveguiding in vacuum deposited polyaniline thin films
Authors: Sharma, Sudhir Kumar; Sharma, V K; Kapoor, A; Misra, S C K; Tripathi, K N
Abstract: Polyaniline thin films prepared by vacuum&#xD;
deposition of polyaniline powder, have been found to exhibit good optical waveguiding&#xD;
properties. The waveguide parameters, refractive index, propagation loss and depth,&#xD;
are found to be strongly affected by doping of these thin films. A detailed study&#xD;
of the optical absorption, effective refractive index, optical propagation losses&#xD;
and propagation depth for these thin films has been carried out using the integrated&#xD;
optics techniques.Vacuum deposited polyaniline thin film planar optical waveguides&#xD;
exhibit low optical attenuation and have optical refractive index 1.590 and excellent&#xD;
transmission in the wavelength range 350-650 nm, which make this polymer promising&#xD;
for integrated optical devices.
Page(s): 377-380</summary>
    <dc:date>2001-12-01T00:00:00Z</dc:date>
  </entry>
  <entry>
    <title>Spectroscopic investigation of BiSeI, SbSeI compounds and BiSbS&lt;sub&gt;x&lt;/sub&gt;Se&lt;sub&gt;l-x&lt;/sub&gt;I solid solutions</title>
    <link rel="alternate" href="http://nopr.niscpr.res.in/handle/123456789/24465" />
    <author>
      <name>Kanchana, G</name>
    </author>
    <author>
      <name>Arivuoli, D</name>
    </author>
    <id>http://nopr.niscpr.res.in/handle/123456789/24465</id>
    <updated>2013-12-07T16:38:27Z</updated>
    <published>2001-12-01T00:00:00Z</published>
    <summary type="text">Title: Spectroscopic investigation of BiSeI, SbSeI compounds and BiSbS&lt;sub&gt;x&lt;/sub&gt;Se&lt;sub&gt;l-x&lt;/sub&gt;I solid solutions
Authors: Kanchana, G; Arivuoli, D
Abstract: The compounds such as SbSeI, BiSeI and&#xD;
solid solutions of BiSbS&lt;sub&gt;x&lt;/sub&gt;Se&lt;sub&gt;1-x&lt;/sub&gt;I (x = 0.2 to 0.8 mol fractions)&#xD;
are grown from vapour by chemical vapour transport method. The IR and Raman spectra&#xD;
were recorded in the range 600-50 cm&lt;sup&gt;-1&lt;/sup&gt;. The IR spectra reveal that&#xD;
the frequency modes are sensitive to selenium substitution and the Raman spectra&#xD;
show that the bands&#xD;
&#xD;
below 200 cm&lt;sup&gt;-1&lt;/sup&gt; are halogen sensitive.
Page(s): 373-376</summary>
    <dc:date>2001-12-01T00:00:00Z</dc:date>
  </entry>
  <entry>
    <title>Microwave related properties of fritless Ag thick film metallisation and effect of long-term air exposure</title>
    <link rel="alternate" href="http://nopr.niscpr.res.in/handle/123456789/24463" />
    <author>
      <name>Puri, Vijaya</name>
    </author>
    <author>
      <name>Rane, S B</name>
    </author>
    <id>http://nopr.niscpr.res.in/handle/123456789/24463</id>
    <updated>2013-12-04T16:38:50Z</updated>
    <published>2001-12-01T00:00:00Z</published>
    <summary type="text">Title: Microwave related properties of fritless Ag thick film metallisation and effect of long-term air exposure
Authors: Puri, Vijaya; Rane, S B
Abstract: Investigations on the laboratory- formulated&#xD;
fritless silver thick film metallisation for use at microwave frequencies is reported&#xD;
here. The reflectometer method has been used to measure the microwave (8-18 GHz)&#xD;
transmittance and reflectance of these films deposited by screen printing onto 96%&#xD;
alumina substrates. The effects of firing temperature, composition and long term&#xD;
air exposure on the microwave properties and d.c. resistivity are also reported. In the X-band&#xD;
frequency, composition and firing temperature-dependent transmittance and reflectance&#xD;
of metallisation are obtained whereas at Ku-band, the above properties are to a&#xD;
large extent independent of these factors. The microwave conductivity as well as&#xD;
the d.c. resistivity&#xD;
are found to increase on aging. The results indicate the utility of these fritless&#xD;
Ag thick film metallisation up to 18 GHz. Firing temperature-independent properties&#xD;
provide substantial energy saving and increased furnace life as the films fired&#xD;
at 800°C compare well with those fired at 900°C especially at higher frequencies.
Page(s): 366-372</summary>
    <dc:date>2001-12-01T00:00:00Z</dc:date>
  </entry>
</feed>

