Please use this identifier to cite or link to this item: http://nopr.niscpr.res.in/handle/123456789/13468
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dc.contributor.authorHussain, K M A-
dc.contributor.authorPodder, J-
dc.contributor.authorSaha, D K-
dc.contributor.authorIchimura, M-
dc.date.accessioned2012-01-25T05:10:27Z-
dc.date.available2012-01-25T05:10:27Z-
dc.date.issued2012-02-
dc.identifier.issn0975-1041 (Online); 0019-5596 (Print)-
dc.identifier.urihttp://hdl.handle.net/123456789/13468-
dc.description117-122en_US
dc.description.abstractCopper indium disulphide (CuInS2) thin films have been deposited on glass substrates by varying Cu:In and S:Cu ratios using spray pyrolysis deposition. The structural, compositional and electrical characterizations of the thin films have been analyzed by Energy Dispersive X-ray Analysis (EDAX), Scanning Electron Microscopy (SEM), X-ray diffraction (XRD), dc conductivity measurement and UV-VIS-NIR Spectrophotometry. The surface morphology has beenn studied by SEM. From XRD spectrum, the fundamental peaks of CuInS2 (CIS) thin films have been identified as (112), (004)/(200), (204)/(220), (116)/(312) and (224) which indicate the chalcopyrite structure and showed an improvement of crystallinity of CuInS2 thin films for Cu:In:S ratio of 1.14:1:1.88. The temperature variation of dc conductivity showed its semiconducting nature in all the films and the highest conductivity was estimated as 11.1786 (-cm)-1 and the corresponding band gap of 1.48eV.en_US
dc.language.isoen_USen_US
dc.publisherNISCAIR-CSIR, Indiaen_US
dc.rights CC Attribution-Noncommercial-No Derivative Works 2.5 Indiaen_US
dc.sourceIJPAP Vol.50(02) [February 2012]en_US
dc.subjectSpray Pyrolysisen_US
dc.subjectCopper Indium Disulphideen_US
dc.subjectX-ray Diffractionen_US
dc.subjectBand Gapen_US
dc.titleStructural, electrical and optical characterization of CuInS2 thin films deposited by spray pyrolysisen_US
dc.typeArticleen_US
Appears in Collections:IJPAP Vol.50(02) [February 2012]

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