Please use this identifier to cite or link to this item: http://nopr.niscpr.res.in/handle/123456789/16969
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dc.contributor.authorAli, M R-
dc.contributor.authorNishikata, A-
dc.contributor.authorTsuru, T-
dc.date.accessioned2013-04-13T12:13:01Z-
dc.date.available2013-04-13T12:13:01Z-
dc.date.issued1999-11-
dc.identifier.issn0975-0991 (Online); 0971-457X (Print)-
dc.identifier.urihttp://hdl.handle.net/123456789/16969-
dc.description317-324en_US
dc.description.abstractElectrodeposition of aluminium has been carried out by controlled-current and controlled-potential methods from acidic aluminum(III) chloride-N-(n-butyl)pyridinium chloride (BPC) molten bath at room temperature. The electrodeposition of aluminium from acidic AlCl3-BPC melt occurs via instantaneous nucleation mechanism in the very initial stage of the crystal growth. The deposition reaction mechanisms of aluminium in the acidic AlCl3-BPC molten bath are revealed by electrochemical analysis. The experimental Tafel slope of 20 mV dec-1 and the calculated transfer coefficient (αc) of 3 suggest that the rate determining step is a chemical reaction involving the release of the complexing agents via three consecutive single electron transfer steps. The influence of various conditions on electrodeposition and the morphology of the electrodeposited layers have been investigated by X-ray diffractometry and scanning electron microscopy. On increasing the current density smaller particle size and better adhesiveness of the electrodeposited layers have been obtained. The cathodic current efficiency for the deposition of Aluminium is about 99.8%.en_US
dc.language.isoen_USen_US
dc.publisherNISCAIR-CSIR, Indiaen_US
dc.rights CC Attribution-Noncommercial-No Derivative Works 2.5 Indiaen_US
dc.sourceIJCT Vol.06(6) [November 1999]en_US
dc.titleElectrodeposition mechanism of aluminium from aluminium chloride-N-(n-butyl)pyridinium chloride room temperature molten salten_US
dc.typeArticleen_US
Appears in Collections:IJCT Vol.06(6) [November 1999]

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