Please use this identifier to cite or link to this item: http://nopr.niscpr.res.in/handle/123456789/24358
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dc.contributor.authorRao, K Srinivasa-
dc.contributor.authorMadhuri, K V-
dc.contributor.authorUthanna, S-
dc.contributor.authorNaidu, B S-
dc.contributor.authorHussain, O M-
dc.date.accessioned2013-11-29T09:24:55Z-
dc.date.available2013-11-29T09:24:55Z-
dc.date.issued2001-06-
dc.identifier.issn0975-1017 (Online); 0971-4588 (Print)-
dc.identifier.urihttp://hdl.handle.net/123456789/24358-
dc.description177-181en_US
dc.description.abstractDC conductivity of thin films of MoO3, prepared by activated reactive evaporation technique, revealed electron hopping conduction at lower temperature and the intrinsic thermally activated process at higher temperature. The dielectric properties of Al/MoO3/Al thin film sandwich structures were studied in the frequency range 0.050-100 kHz and in the temperature range 80-400 K. The frequency and temperature dependences of capacitance and dielectric loss were also studied.en_US
dc.language.isoen_USen_US
dc.publisherNISCAIR-CSIR, Indiaen_US
dc.rights CC Attribution-Noncommercial-No Derivative Works 2.5 Indiaen_US
dc.sourceIJEMS Vol.08(3) [June 2001]en_US
dc.titleElectrical properties of MoO3 filmsen_US
dc.typeArticleen_US
Appears in Collections:IJEMS Vol.08(3) [June 2001]

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