Please use this identifier to cite or link to this item: http://nopr.niscpr.res.in/handle/123456789/27196
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dc.contributor.authorGadkari, D B-
dc.contributor.authorShashidharan, P-
dc.contributor.authorLal, K B-
dc.contributor.authorGokhale, N A-
dc.contributor.authorShah, A P-
dc.contributor.authorArora, B M-
dc.date.accessioned2014-02-28T04:10:32Z-
dc.date.available2014-02-28T04:10:32Z-
dc.date.issued1999-09-
dc.identifier.issn0975-1041 (Online); 0019-5596 (Print)-
dc.identifier.urihttp://hdl.handle.net/123456789/27196-
dc.description652-656en_US
dc.description.abstractInxGa1-xSb (x= 0.5) single crystals of 12 mm diameter and 50-60 mm length have been grown from stoichiometric source materials by using vertical directional solidification technique. The optimized growth conditions are ampoule translation velocity 0.84μm/sec, rotation speed 10 rpm and ampoule with argon pressure (100 torr). The axial compositional profile has been determined by Vegard-law and showed mixing of the melt. Hall measurements reveal the conversion of n-type to p-type conduction along the growth axis and vice versa. Radial resistivity measurements by four probe exhibited the nearly homogeneous growth . The growth morphology was attributed to the intrinsic crystallographic microstructures.en_US
dc.language.isoen_USen_US
dc.publisherNISCAIR-CSIR, Indiaen_US
dc.rights CC Attribution-Noncommercial-No Derivative Works 2.5 Indiaen_US
dc.sourceIJPAP Vol.37(09) [September 1999]en_US
dc.titleGrowth morphology and compositional analysis of InxGa1-xSb crystals-grown by vertical directional solidification techniqueen_US
dc.typeArticleen_US
Appears in Collections:IJPAP Vol.37(09) [September 1999]

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