Please use this identifier to cite or link to this item:
http://nopr.niscpr.res.in/handle/123456789/29343Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ohtake, Toshihito | - |
| dc.date.accessioned | 2014-09-05T06:58:46Z | - |
| dc.date.available | 2014-09-05T06:58:46Z | - |
| dc.date.issued | 2014-09 | - |
| dc.identifier.issn | 0975-1084 (Online); 0022-4456 (Print) | - |
| dc.identifier.uri | http://hdl.handle.net/123456789/29343 | - |
| dc.description | 598-600 | en_US |
| dc.description.abstract | We confirmed methyl termination on n-Si(111) surface by ATR-FTIR measurement, which was fabricated by a photo chloro-reaction and its methylation. The coverage of the methylation was about 63.7 %, and the surface was not re-terminated by hydrogen. Photoelectrochemical properties of the n-Si(111) was measured as an electrode for a photoelectrochemical cell, and an onset potential obtaining photocurrent for the methyl terminated n-Si(111) electrode was observed as negative shift at 70 mV comparing with that of the hydrogen terminated n-Si(111) electrode. Therefore, the negative shift would be expected for improving open circuit voltage towards solar cell. | en_US |
| dc.language.iso | en_US | en_US |
| dc.publisher | NISCAIR-CSIR, India | en_US |
| dc.rights | CC Attribution-Noncommercial-No Derivative Works 2.5 India | en_US |
| dc.source | JSIR Vol.73(09) [September 2014] | en_US |
| dc.subject | Methyl termination | en_US |
| dc.subject | ATR-FTIR | en_US |
| dc.subject | Semiconductor electrode | en_US |
| dc.subject | Si | en_US |
| dc.subject | Photoelectrochemical cell | en_US |
| dc.title | Methyl termination and ATR-FTIR evaluation of n-Si (111) electrode towards photoelectrochemical cell fabrication | en_US |
| dc.type | Article | en_US |
| Appears in Collections: | JSIR Vol.73(09) [September 2014] | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| JSIR 73(9) 598-600.pdf | 146.92 kB | Adobe PDF | View/Open |
Items in NOPR are protected by copyright, with all rights reserved, unless otherwise indicated.