Please use this identifier to cite or link to this item: http://nopr.niscpr.res.in/handle/123456789/29740
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dc.contributor.authorChattopadhyay, P-
dc.contributor.authorMajumdar, L-
dc.date.accessioned2014-11-05T11:16:22Z-
dc.date.available2014-11-05T11:16:22Z-
dc.date.issued1997-10-
dc.identifier.issn0975-1017 (Online); 0971-4588 (Print)-
dc.identifier.urihttp://hdl.handle.net/123456789/29740-
dc.description220-224en_US
dc.description.abstractA method for the determination of the interface state density of a metal-semiconductor field effect transistor is developed which requires an analysis of the temperature dependence of threshold voltage over a certain range of temperature. The method is used to estimate the values of interface state densities of GaAs MESFETs from the available experimental data on threshold voltage in the literature.en_US
dc.language.isoen_USen_US
dc.publisherNISCAIR-CSIR, Indiaen_US
dc.rights CC Attribution-Noncommercial-No Derivative Works 2.5 Indiaen_US
dc.sourceIJEMS Vol.04(5) [October 1997]en_US
dc.titleDetermination of interface state density of metal-semiconductor field effect transistorsen_US
dc.typeArticleen_US
Appears in Collections:IJEMS Vol.04(5) [October 1997]

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