<span style="mso-bidi-language:HI">Studies of metal ion uptake behaviour of formaldehyde condensed resins of phenolic Schiff bases derived from the reaction of 4,4' -diaminodiphenyl and 4, 4' -diaminodiphenylmethane with <i>o</i>-hydroxybenzaldehyde </span>

Abstract

<span style="mso-bidi-language:HI">The metal ion uptake characteristics of two new chelating resins, <i><span style="mso-bidi-font-family:Arial;mso-bidi-language: HI">o</span></i><span style="mso-bidi-font-family:Arial;mso-bidi-language:HI">-HB-DDM-HCHO <span style="mso-bidi-language:HI">and <i><span style="mso-bidi-font-family: Arial;mso-bidi-language:HI">o-</span></i><span style="mso-bidi-font-family: Arial;mso-bidi-language:HI">HB-DD-HCHO<i>, </i><span style="mso-bidi-language: HI">were examined towards transition metal ions like Cu²⁺, Ni²⁺ and UO₂²⁺under both competitive and non-competitive conditions. The resin <i><span style="mso-bidi-font-family:Arial; mso-bidi-language:HI">o</span></i><span style="mso-bidi-font-family:Arial; mso-bidi-language:HI">-HB-DDM-HCHO<i> </i><span style="mso-bidi-language: HI">was found to be more effective in removing metal ions in comparison to resin <i><span style="mso-bidi-font-family:Arial;mso-bidi-language:HI">o</span></i><span style="mso-bidi-font-family:Arial;mso-bidi-language:HI">-HB-DD<span style="mso-bidi-language:HI">HCHO. Preferential adsorption of Cu^{<span style="mso-bidi-font-family:Arial;mso-bidi-language:HI">2</span>}^{<span style="mso-bidi-language:HI">+</span>}<span style="mso-bidi-language:HI"> by both the resins was observed from the mixture of salt solution. Elution of the sorbed metal ions using dilute HCI resulted in removal of nearly 30-40% of the loaded Cu^{<span style="mso-bidi-font-family:Arial;mso-bidi-language: HI">2</span>}^{<span style="mso-bidi-language:HI">+</span>}<span style="mso-bidi-language:HI"> and 34-45% of loaded UO₂²⁺from the resin column.

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