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http://nopr.niscpr.res.in/handle/123456789/30903| Title: | Electrochemical behaviour of niobium and niobium passive films in nitric acid solutions |
| Authors: | Badawy, W A AI-Kharafi, F M |
| Issue Date: | Mar-1997 |
| Publisher: | NISCAIR-CSIR, India |
| Abstract: | Electrochemical behaviour of bare niobium and phosphoric acid anodized niobium electrodes is investigated in nitric acid solutions. Electrochemical impedance spectroscopy and polarization techniques have been used to investigate the open-circuit growth of the passive film. The stability of the anodic oxide film has been studied as a function of the formation voltage, formation current density and concentration of the ambient electrolyte. The results show that the Nb-Nb2O5-1M HNO3 does not behave as a perfect dielectric. The flat band potential and donor concentration of the semiconducting anodic oxide film have been calculated from the Mott-Schottky plots. |
| Page(s): | 94-100 |
| ISSN: | 0975-0991 (Online); 0971-457X (Print) |
| Appears in Collections: | IJCT Vol.04(2) [March 1997] |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| IJCT 4(2) 94-100.pdf | 1.59 MB | Adobe PDF | View/Open |
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