Please use this identifier to cite or link to this item: http://nopr.niscpr.res.in/handle/123456789/3978
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dc.contributor.authorShanthi, C-
dc.contributor.authorBarathan, S-
dc.contributor.authorJaiswal, Rajasrisen-
dc.contributor.authorArunachalam, R M-
dc.date.accessioned2009-04-23T08:17:43Z-
dc.date.available2009-04-23T08:17:43Z-
dc.date.issued2009-04-
dc.identifier.issn0971-4588-
dc.identifier.urihttp://hdl.handle.net/123456789/3978-
dc.description128-132en_US
dc.description.abstractThe objective of this work is to make a comparative study of dc and pulse plating of silver on silver alloy. The dc and pulsed electro deposition of silver on silver alloy is analyzed from an alkaline cyanide bath with brightener. Pulse duty cycles of 20 to 80%, at frequencies 10, 25, 50 and 100 Hz with peak current densities of 3.21, 3.75 and 4.55 A/dm2 are employed. The influences of peak current density on the thickness and current efficiency of the plating process are studied. The surface morphology is characterized by SEM and XRD. Less porosity and fine grains are formed by pulse plating compared to that formed by dc plating.en_US
dc.language.isoen_USen_US
dc.publisherCSIRen_US
dc.sourceIJEMS Vol.16(2) [April 2009]en_US
dc.subjectDC platingen_US
dc.subjectPulse platingen_US
dc.subjectSilveren_US
dc.subjectDuty cycleen_US
dc.subjectFrequencyen_US
dc.subjectCurrent efficiencyen_US
dc.titleStudy of surface morphology in DC and pulse plating of silver alloyen_US
dc.typeArticleen_US
Appears in Collections:IJEMS Vol.16(2) [April 2009]

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