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dc.contributor.authorKalra, K C-
dc.contributor.authorSingh, K C-
dc.contributor.authorSingh, Mohinder-
dc.date.accessioned2017-02-17T09:56:17Z-
dc.date.available2017-02-17T09:56:17Z-
dc.date.issued1997-03-
dc.identifier.issn0975-0975(Online); 0376-4710(Print)-
dc.identifier.urihttp://nopr.niscair.res.in/handle/123456789/40501-
dc.description216-218en_US
dc.description.abstractVarious formation and breakdown parameters for anodic growth of oxide films on tantalum, aluminium, niobium and titanium using the same electrolyte, same temperature range and same current density range have been obtained. No correlation has been found between the various formation (or breakdown) parameters and various solid state properties.en_US
dc.language.isoen_USen_US
dc.publisherNISCAIR-CSIR, Indiaen_US
dc.rights CC Attribution-Noncommercial-No Derivative Works 2.5 Indiaen_US
dc.sourceIJC-A Vol.36A(03) [March 1997]en_US
dc.titleFormation and breakdown characteristics of anodic oxide films on valve metalen_US
dc.typeArticleen_US
Appears in Collections:IJC-A Vol.36A(03) [March 1997]

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