Please use this identifier to cite or link to this item: http://nopr.niscpr.res.in/handle/123456789/4213
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dc.contributor.authorSingh, A P-
dc.contributor.authorSrivastava, K K-
dc.contributor.authorShekhar, H-
dc.date.accessioned2009-05-18T03:56:16Z-
dc.date.available2009-05-18T03:56:16Z-
dc.date.issued2009-03-
dc.identifier.issn0971 – 457X-
dc.identifier.urihttp://hdl.handle.net/123456789/4213-
dc.description136-141en_US
dc.description.abstractThe removal of As(III) from its aqueous solutions by adsorption on homogeneous mixture of china clay and fly ash in equal proportions has been found to be dependent on various operating parameters such as concentration, temperature and pH. The As(III) removal is favourable at low concentration, high temperature and slightly basic condition at pH 8.0. The applicability of Langmuir isotherm in present system suggests the formation of monolayer coverage of As(III) molecules at the outer surface of the adsorbent. Thermodynamic parameters indicate the spontaneous and endothermic nature of the process. Adsorption kinetics studied using the model suggested by Lagergren infers a first order rate expression.en_US
dc.language.isoen_USen_US
dc.publisherCSIRen_US
dc.sourceIJCT Vol.16(2) [March 2009]en_US
dc.subjectAs(III) adsorptionen_US
dc.subjectAdsorption kineticsen_US
dc.subjectChina clayen_US
dc.subjectFly ashen_US
dc.subjectLangmuir isothermen_US
dc.titleArsenic (III) removal from aqueous solutions by mixed adsorbenten_US
dc.typeArticleen_US
Appears in Collections:IJCT Vol.16(2) [March 2009]

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