Please use this identifier to cite or link to this item: http://nopr.niscpr.res.in/handle/123456789/46877
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dc.contributor.authorSharon, Maheshwar-
dc.contributor.authorPrasad, B M-
dc.contributor.authorBasavaswaran, K-
dc.date.accessioned2019-03-28T05:13:23Z-
dc.date.available2019-03-28T05:13:23Z-
dc.date.issued1989-11-
dc.identifier.issn0975-0975(Online); 0376-4710(Print)-
dc.identifier.urihttp://nopr.niscair.res.in/handle/123456789/46877-
dc.description935-941en_US
dc.description.abstractA new technique to measure surface conductivity has been developed. This technique which can be used with either a thin film or a pellet can also provide information on (i) flat-band potential at a desired pH, (ii) barrier height developed at the interface of semiconductor-electrolyte at any desired pH and (iii) flat-band potential at a desired surface charge present at the semiconductor. A model has been developed to explain the mechanism of surface conductivity of a semiconductor, such as ɑ-Fe2O3 or n-SnS or p-SnSe.en_US
dc.language.isoen_USen_US
dc.publisherNISCAIR-CSIR, Indiaen_US
dc.rights CC Attribution-Noncommercial-No Derivative Works 2.5 Indiaen_US
dc.sourceIJC-A Vol.28A(11) [November 1989]en_US
dc.titleA new technique to measure flat band potential and barrier height at a desired surface charge of n- and p-semiconductorsen_US
dc.typeArticleen_US
Appears in Collections:IJC-A Vol.28A(11) [November 1989]

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