Please use this identifier to cite or link to this item: http://nopr.niscpr.res.in/handle/123456789/47663
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dc.contributor.authorNigam, R K-
dc.contributor.authorKalra, K C-
dc.contributor.authorKatyal, Parveen-
dc.date.accessioned2019-06-04T10:16:03Z-
dc.date.available2019-06-04T10:16:03Z-
dc.date.issued1988-07-
dc.identifier.issn0975-0975(Online); 0376-4710(Print)-
dc.identifier.urihttp://nopr.niscair.res.in/handle/123456789/47663-
dc.description569-573en_US
dc.language.isoen_USen_US
dc.publisherNISCAIR-CSIR, Indiaen_US
dc.rights CC Attribution-Noncommercial-No Derivative Works 2.5 Indiaen_US
dc.sourceIJC-A Vol.27A(07) [July 1988]en_US
dc.titleFormation of Anodic Oxide Films on Tantalum in Presence of Ultraviolet Radiations &Heat Treatment of Anodic Tantalum Oxide Filmsen_US
dc.typeArticleen_US
Appears in Collections:IJC-A Vol.27A(07) [July 1988]

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