Suppression of Formation of Silicon Tetrachloride during Preparation of Silicon from Trichlorosilane

Dongare, M K; Mulla, I S; Sinha, A P B

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Please use this identifier to cite or link to this item: http://nopr.niscpr.res.in/handle/123456789/47740

Full metadata record

DC Field	Value	Language
dc.contributor.author	Dongare, M K	-
dc.contributor.author	Mulla, I S	-
dc.contributor.author	Sinha, A P B	-
dc.date.accessioned	2019-06-07T04:58:28Z	-
dc.date.available	2019-06-07T04:58:28Z	-
dc.date.issued	1988-10	-
dc.identifier.issn	0975-0975(Online); 0376-4710(Print)	-
dc.identifier.uri	http://nopr.niscair.res.in/handle/123456789/47740	-
dc.description	902-904	en_US
dc.language.iso	en_US	en_US
dc.publisher	NISCAIR-CSIR, India	en_US
dc.rights	CC Attribution-Noncommercial-No Derivative Works 2.5 India	en_US
dc.source	IJC-A Vol.27A(10) [October 1988]	en_US
dc.title	Suppression of Formation of Silicon Tetrachloride during Preparation of Silicon from Trichlorosilane	en_US
dc.type	Article	en_US
Appears in Collections:	IJC-A Vol.27A(10) [October 1988]

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