Please use this identifier to cite or link to this item: http://nopr.niscpr.res.in/handle/123456789/54580
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dc.contributor.authorSantos, Everton D-
dc.contributor.authorLuqueta, Gerson R-
dc.contributor.authorAbdala, Julia M A-
dc.contributor.authorRamu, Rajasekaran-
dc.contributor.authorEsposito, Elisa-
dc.contributor.authorRezende, Leandro B-
dc.contributor.authorVieira, Lucia-
dc.contributor.authorMilton, B (Jr)-
dc.date.accessioned2020-06-23T06:35:40Z-
dc.date.available2020-06-23T06:35:40Z-
dc.date.issued2020-06-
dc.identifier.issn0975-1025 (Online); 0971-0426 (Print)-
dc.identifier.urihttp://nopr.niscair.res.in/handle/123456789/54580-
dc.description197-206en_US
dc.description.abstractPhysical vapor deposition - plasma enhanced chemical vapor deposition (PVD-PECVD) system has been used exclusively for deposition and doping of carbonaceous films [silver nanoparticles (Ag-NPs)] on cotton fabrics and the findings are compared, in terms of technical efficiency and microbial inhibition, with those of the magnetron sputtering (MS) technique. It is found that the proposed technique presents promising characteristics for the deposition of silver nanoparticles (Ag-NPs) on textiles, which meet the industrial demand.en_US
dc.language.isoen_USen_US
dc.publisherNISCAIR-CSIR, Indiaen_US
dc.rights CC Attribution-Noncommercial-No Derivative Works 2.5 Indiaen_US
dc.sourceIJFTR Vol.45(2) [June 2020]en_US
dc.subjectAntimicrobial propertiesen_US
dc.subjectActive plasma screenen_US
dc.subjectMagnetron sputteringen_US
dc.subjectPlasma enhanced chemical vapor depositionen_US
dc.subjectPhysical vapor depositionen_US
dc.subjectSilver nanoparticlesen_US
dc.titleAntimicrobial silver coating using PVD-PECVD systemen_US
dc.typeArticleen_US
Appears in Collections:IJFTR Vol.45(2) [June 2020]

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