Please use this identifier to cite or link to this item: http://nopr.niscpr.res.in/handle/123456789/65458
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dc.contributor.authorDixit, Megha-
dc.contributor.authorArora, Anil-
dc.contributor.authorBasu, Soumen-
dc.contributor.authorYadav, R P-
dc.contributor.authorJoshi, Hem Dutt-
dc.date.accessioned2025-03-04T04:50:05Z-
dc.date.available2025-03-04T04:50:05Z-
dc.date.issued2025-02-
dc.identifier.issnISSN: 0975-1041 (Online) ;ISSN: 0019-5596 (Print)-
dc.identifier.urihttp://nopr.niscpr.res.in/handle/123456789/65458-
dc.description175-180en_US
dc.description.abstractThis research paper presents a method for synthesizing reduced graphene oxide (rGO) ink and investigates its morphological behavior based on sonication time. This study also explores the experimental verification of rGO's functionality as a tunable attenuator operating in the 1-8 GHz range. The synthesis process consists of three phases: synthesis of graphene oxide (GO), reduction of GO to rGO, and dispersion of rGO powder in a solvent. A comparative analysis of morphological and functional behavior is conducted by varying sonication time using X-ray Diffraction (XRD), Scanning Electron Microscope (SEM), and Energy Dispersive Spectroscopy (EDS). Results indicate that increased sonication time enhances the quality of multi-layered graphene, resulting in finer stacked layers and improved electrical properties. Also, measuring insertion loss at different biased voltages shows that r-GO ink can be used as a microwave tunable attenuator. This study provides valuable insights into the synthesis and characterization of rGO ink, highlighting its potential applications in the field of microwave electronics.en_US
dc.language.isoenen_US
dc.publisherNIScPR-CSIR, Indiaen_US
dc.sourceIJPAP Vol.63(02) [February 2025]en_US
dc.subjectGraphene oxideen_US
dc.subjectX-ray Diffractionen_US
dc.subjectScanning Electron Microscopeen_US
dc.titleDevelopment and Characterization of RGO Ink for Microwave Absorber based Stealth Applicationen_US
dc.typeArticleen_US
dc.identifier.doihttps://doi.org/10.56042/ijpap.v63i2.11156en_US
Appears in Collections:IJPAP Vol.63(02) [February 2025]

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