Please use this identifier to cite or link to this item: http://nopr.niscpr.res.in/handle/123456789/18459
Title: Silyl-nitrogen compounds: Part XII - Mode of addition reactions in trisila-phospha-triazene
Authors: Vasisht, S K
Kaur, Tripat P
Kaushal, Jyotsna
Issue Date: Mar-2001
Publisher: NISCAIR-CSIR, India
Abstract: Tris(trimethylsilyl)-2-phospha-1-triazene (Me3Si)2N-P=N(SiMe3) (1) reacts with alkyllithium RLi (R = Me, Bu) to form an intermediate amide at low temperature, which rearranges into phosphoranide at room temperature. The intermediate amide reacts with Me3SnCl to form phosphine, (Me3Si)2N-P (R)- N(SiMe3)(SnMe3) which rearranges slowly at room temperature to form phosphorane (Me3Si)2N-P (R)(SnMe3)(= N(SiMe3) . However, a similar silyl derivative (Me3Si)2N-P (R)- N(SiMe3) is stable at room temperature and does not migrate intramolecularly into phosphorane.
Page(s): 232-235
ISSN: 0975-0975(Online); 0376-4710(Print)
Appears in Collections:IJC-A Vol.40A(03) [March 2001]

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