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dc.contributor.authorVasisht, S K-
dc.contributor.authorKaur, Tripat P-
dc.contributor.authorKaushal, Jyotsna-
dc.date.accessioned2013-05-28T08:49:32Z-
dc.date.available2013-05-28T08:49:32Z-
dc.date.issued2001-03-
dc.identifier.issn0975-0975(Online); 0376-4710(Print)-
dc.identifier.urihttp://hdl.handle.net/123456789/18459-
dc.description232-235en_US
dc.description.abstractTris(trimethylsilyl)-2-phospha-1-triazene (Me3Si)2N-P=N(SiMe3) (1) reacts with alkyllithium RLi (R = Me, Bu) to form an intermediate amide at low temperature, which rearranges into phosphoranide at room temperature. The intermediate amide reacts with Me3SnCl to form phosphine, (Me3Si)2N-P (R)- N(SiMe3)(SnMe3) which rearranges slowly at room temperature to form phosphorane (Me3Si)2N-P (R)(SnMe3)(= N(SiMe3) . However, a similar silyl derivative (Me3Si)2N-P (R)- N(SiMe3) is stable at room temperature and does not migrate intramolecularly into phosphorane.en_US
dc.language.isoen_USen_US
dc.publisherNISCAIR-CSIR, Indiaen_US
dc.rights CC Attribution-Noncommercial-No Derivative Works 2.5 Indiaen_US
dc.sourceIJC-A Vol.40A(03) [March 2001]en_US
dc.titleSilyl-nitrogen compounds: Part XII - Mode of addition reactions in trisila-phospha-triazeneen_US
dc.typeArticleen_US
Appears in Collections:IJC-A Vol.40A(03) [March 2001]

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