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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Vasisht, S K | - |
| dc.contributor.author | Kaur, Tripat P | - |
| dc.contributor.author | Kaushal, Jyotsna | - |
| dc.date.accessioned | 2013-05-28T08:49:32Z | - |
| dc.date.available | 2013-05-28T08:49:32Z | - |
| dc.date.issued | 2001-03 | - |
| dc.identifier.issn | 0975-0975(Online); 0376-4710(Print) | - |
| dc.identifier.uri | http://hdl.handle.net/123456789/18459 | - |
| dc.description | 232-235 | en_US |
| dc.description.abstract | Tris(trimethylsilyl)-2-phospha-1-triazene (Me3Si)2N-P=N(SiMe3) (1) reacts with alkyllithium RLi (R = Me, Bu) to form an intermediate amide at low temperature, which rearranges into phosphoranide at room temperature. The intermediate amide reacts with Me3SnCl to form phosphine, (Me3Si)2N-P (R)- N(SiMe3)(SnMe3) which rearranges slowly at room temperature to form phosphorane (Me3Si)2N-P (R)(SnMe3)(= N(SiMe3) . However, a similar silyl derivative (Me3Si)2N-P (R)- N(SiMe3) is stable at room temperature and does not migrate intramolecularly into phosphorane. | en_US |
| dc.language.iso | en_US | en_US |
| dc.publisher | NISCAIR-CSIR, India | en_US |
| dc.rights | CC Attribution-Noncommercial-No Derivative Works 2.5 India | en_US |
| dc.source | IJC-A Vol.40A(03) [March 2001] | en_US |
| dc.title | Silyl-nitrogen compounds: Part XII - Mode of addition reactions in trisila-phospha-triazene | en_US |
| dc.type | Article | en_US |
| Appears in Collections: | IJC-A Vol.40A(03) [March 2001] | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| IJCA 40A(3) 232-235.pdf | 707.12 kB | Adobe PDF | View/Open |
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