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http://nopr.niscpr.res.in/handle/123456789/18459| Title: | Silyl-nitrogen compounds: Part XII - Mode of addition reactions in trisila-phospha-triazene |
| Authors: | Vasisht, S K Kaur, Tripat P Kaushal, Jyotsna |
| Issue Date: | Mar-2001 |
| Publisher: | NISCAIR-CSIR, India |
| Abstract: | Tris(trimethylsilyl)-2-phospha-1-triazene (Me3Si)2N-P=N(SiMe3) (1) reacts with alkyllithium RLi (R = Me, Bu) to form an intermediate amide at low temperature, which rearranges into phosphoranide at room temperature. The intermediate amide reacts with Me3SnCl to form phosphine, (Me3Si)2N-P (R)- N(SiMe3)(SnMe3) which rearranges slowly at room temperature to form phosphorane (Me3Si)2N-P (R)(SnMe3)(= N(SiMe3) . However, a similar silyl derivative (Me3Si)2N-P (R)- N(SiMe3) is stable at room temperature and does not migrate intramolecularly into phosphorane. |
| Page(s): | 232-235 |
| ISSN: | 0975-0975(Online); 0376-4710(Print) |
| Appears in Collections: | IJC-A Vol.40A(03) [March 2001] |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| IJCA 40A(3) 232-235.pdf | 707.12 kB | Adobe PDF | View/Open |
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