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http://nopr.niscpr.res.in/handle/123456789/19925| Title: | Structural, optical and electrical properties of (V2O5)1-x-(MoO3)x thin films |
| Authors: | Prameela, Ch Anjaiah, M Murthy, K Krishna Srinivasarao, K |
| Keywords: | Mixed oxide thin films;Flash evaporation;Characterization |
| Issue Date: | Aug-2013 |
| Publisher: | NISCAIR-CSIR, India |
| Abstract: | Thin films of V2O5, MoO3 and (V2O5)1-x-(MoO3)x were deposited on to glass and p-Si (1 0 0) substrates by flash evaporation technique at the substrate temperatures of 300 K and 500 K at a fixed oxygen partial pressure of 5´10-4 mbar. These deposited films were characterized by XRD, IR, UV VIS spectra. The structure of (V2O5)1-x-(MoO3)x films is found to be amorphous for x= 0.5. The IR spectra confirm the formation of (V2O5)1-x-(MoO3)x mixed oxide films for 0<x<1. The energy gaps of the mixed oxide films are in between 2.1 to 2.56 eV. The width of localized states is 0.92 eV (for x=0). The electrical conductivity of the V2O5 films is 2´10-3 ohm-1 cm-1 and decreases with increasing the MoO3 concentration in (V2O5)1-x-(MoO3)x thin films. |
| Page(s): | 563-568 |
| ISSN: | 0975-1041 (Online); 0019-5596 (Print) |
| Appears in Collections: | IJPAP Vol.51(08) [August 2013] |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| IJPAP 51(8) 563-568.pdf | 152.08 kB | Adobe PDF | View/Open |
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